Title:
METHOD FOR MANUFACTURING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2021/060860
Kind Code:
A1
Abstract:
The present invention relates to a method for manufacturing a thin film. More specifically, the present invention relates to a method for manufacturing a thin film, comprising the steps of: i) adsorbing, on a substrate surface, a growth inhibitor for forming a thin film, the growth inhibitor being represented by the following formula 1: [Formula 1] AnBmXo (A is carbon or silicon, B is hydrogen or alkyl having 1-3 carbon atoms, X is halogen, n is an integer of 1 to 15, o is an integer greater than or equal to 1, and m is 0 to 2n+1); and ii) adsorbing a Ti-based thin film precursor on the substrate surface on which the growth inhibitor is adsorbed. According to the present invention, provided is a method for manufacturing a thin film wherein side reactions are suppressed so as to reduce a thin film growth rate, and process by-products are removed from a film so as to greatly improve the step coverage and thickness uniformity of the thin film even when the thin film is formed on a substrate having a complex structure. [Representative drawing] figure 2
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Inventors:
YEON CHANG BONG (KR)
JUNG JAE SUN (KR)
BYUN HYE RAN (KR)
SONG TAE HO (KR)
KIM SO JUNG (KR)
LEE SEOK JONG (KR)
JUNG JAE SUN (KR)
BYUN HYE RAN (KR)
SONG TAE HO (KR)
KIM SO JUNG (KR)
LEE SEOK JONG (KR)
Application Number:
PCT/KR2020/012930
Publication Date:
April 01, 2021
Filing Date:
September 24, 2020
Export Citation:
Assignee:
SOULBRAIN CO LTD (KR)
International Classes:
H01L21/02; C23C16/448; C23C16/455; H01L21/285
Foreign References:
| KR20130105238A | 2013-09-25 | |||
| KR20030071226A | 2003-09-03 | |||
| KR20010032726A | 2001-04-25 | |||
| KR20130116173A | 2013-10-23 | |||
| KR102141547B1 | 2020-09-14 |
Attorney, Agent or Firm:
NEWKOREA PATENT & LAW FIRM (KR)
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