Title:
METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR MATERIAL, AND APPLICATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2017/043474
Kind Code:
A1
Abstract:
To provide: a method for producing a heterocycle-containing polymer precursor material which exhibits excellent preservation stability; a heterocycle-containing polymer precursor material; a composition; and a photosensitive resin composition. A method for producing a heterocycle-containing polymer precursor material which includes: adding a polymerization inhibitor to a composition comprising a heterocycle-containing polymer precursor and a first solvent, or adding a first solvent and a polymerization inhibitor to a composition comprising a heterocycle-containing polymer precursor; and adding a second solvent to the composition to which the polymerization inhibitor was added, and precipitating the heterocycle-containing polymer precursor and polymerization inhibitor in the second solvent, wherein the heterocycle-containing polymer precursor is selected from a polyimide precursor having a polymerizable group and a polybenzoxazole precursor having a polymerizable group.
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Inventors:
KAWABATA TAKESHI (JP)
KOYAMA ICHIRO (JP)
IWAI YU (JP)
SHIBUYA AKINORI (JP)
KOYAMA ICHIRO (JP)
IWAI YU (JP)
SHIBUYA AKINORI (JP)
Application Number:
PCT/JP2016/076131
Publication Date:
March 16, 2017
Filing Date:
September 06, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08L79/08; C08K5/13; C08L79/04; G03F7/027; H01L21/312
Foreign References:
JPS62184056A | 1987-08-12 | |||
JPH1138619A | 1999-02-12 | |||
JP2004325616A | 2004-11-18 | |||
JP2008096503A | 2008-04-24 | |||
JP2015224261A | 2015-12-14 |
Attorney, Agent or Firm:
SIKS & CO. (JP)
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