Title:
METHOD FOR PRODUCING INK COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/202439
Kind Code:
A1
Abstract:
An ink composition is provided with which it is possible to improve the external quantum yield of photoelectric conversion elements. Provided is a method for producing an ink composition which comprises a p-type semiconductor material, an n-type semiconductor material, and a solvent, the method including a step in which one or more compositions obtained by dissolving, in the solvent, either or both of the p-type semiconductor material and the n-type semiconductor material are prepared and a step in which the compositions are stored for four days or longer and the ink compositions is produced. The p-type semiconductor material includes a polymer having a donor-acceptor structure.
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Inventors:
KATAKURA SHIRO (JP)
YOKOI YUKI (JP)
YOKOI YUKI (JP)
Application Number:
PCT/JP2022/011304
Publication Date:
September 29, 2022
Filing Date:
March 14, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C09D11/10; H01L51/42; H01L51/46
Domestic Patent References:
| WO2019082844A1 | 2019-05-02 | |||
| WO2016076213A1 | 2016-05-19 | |||
| WO2019124506A1 | 2019-06-27 | |||
| WO2013051676A1 | 2013-04-11 |
Foreign References:
| JP2020080328A | 2020-05-28 |
Other References:
See also references of EP 4116381A4
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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