METHOD FOR PRODUCING MATERIAL WITH MODIFIED CARBON ALLOTROPE SURFACE, METHOD FOR PRODUCING MATERIAL WITH CARBON ALLOTROPE SURFACE TO WHICH FUNCTIONAL GROUP IS INTRODUCED, METHOD FOR PRODUCING GRID FOR CRYO-ELECTRON MICROSCOPY, ORGANIC MATERIAL, AND GRID FOR CRYO-ELECTRON MICROSCOPY

Title:

Document Type and Number:

WIPO Patent Application WO/2020/196858

Kind Code:

A1

Abstract:

Provided is a method for producing a material with a modified carbon allotrope surface, the material making it possible to suppress or prevent uneven distribution, orientation bias, and so forth of a structural analysis target material, in structural analysis performed using cryo-electron microscopy. In order to achieve this purpose, a method for producing a material with a modified carbon allotrope surface according to the present invention comprises a surface treatment step of reacting a carbon allotrope surface with a halogen oxide radical, and is characterized by modifying the carbon allotrope surface by the surface treatment step.

Inventors:

INOUE TSUYOSHI (JP)
ASAHARA HARUYASU (JP)
OHKUBO KEI (JP)
IWASAKI KENJI (JP)
MIYAZAKI NAOYUKI (JP)
HIROSE MIKA (JP)
NAKAGAWA ATSUSHI (JP)
TAKAGI JUNICHI (JP)
DOI TAKEFUMI (JP)
ADACHI HIROAKI (JP)

Application Number:

PCT/JP2020/014148

Publication Date:

October 01, 2020

Filing Date:

March 27, 2020

Export Citation:

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Assignee:

UNIV OSAKA (JP)

International Classes:

C01B32/05; C01B11/02; C01B32/156; C01B32/168; C01B32/194; H01J37/20

Foreign References:

JP2015147723A	2015-08-20
JP2010535148A	2010-11-18
JP2008529952A	2008-08-07
JP2013056805A	2013-03-28
JP2003505332A	2003-02-12
JP2010005428A	2010-01-14
JP2008230880A	2008-10-02
JP2016532267A	2016-10-13
JP2005250721A	2005-09-15
JP2019061938A	2019-04-18

Other References: