Title:
METHOD FOR PRODUCING MOLD FOR FINE PATTERN TRANSFER, METHOD FOR PRODUCING DIFFRACTION GRATING USING SAME, AND METHOD FOR MANUFACTURING ORGANIC EL ELEMENT WHICH COMPRISES THE DIFFRACTION GRATING
Document Type and Number:
WIPO Patent Application WO/2012/096368
Kind Code:
A1
Abstract:
A method for producing a mold comprises: to coat a base (10) with a block copolymer solution (30), said block copolymer being composed of first and second polymers; to carry out a first annealing process at a temperature higher than the glass transition temperature of the block copolymer after drying the coating film; to form a microrelief structure (36) on the base by removing the second polymer by an etching process; to subject the microrelief structure (36) to a second annealing process at a temperature higher than the glass transition temperature of the first polymer; to form a seed layer (40) on the microrelief structure; to laminate a metal layer (50) on the seed layer (40) by electroforming; and to remove the metal layer (50) from the base. The microrelief structure (70) on the base is successfully transferred to the metal layer by the second annealing process. Consequently, a mold for fine pattern transfer, which is suitable for the production of an optical component such as a diffraction grating, is provided.
Inventors:
MASUYAMA SATOSHI (JP)
FUKUSHIMA MADOKA (JP)
NISHIMURA SUZUSHI (JP)
FUKUDA MAKI (JP)
SEKI TAKASHI (JP)
FUKUSHIMA MADOKA (JP)
NISHIMURA SUZUSHI (JP)
FUKUDA MAKI (JP)
SEKI TAKASHI (JP)
Application Number:
PCT/JP2012/050564
Publication Date:
July 19, 2012
Filing Date:
January 13, 2012
Export Citation:
Assignee:
JX NIPPON OIL & ENERGY CORP (JP)
TOKYO INST TECH (JP)
MASUYAMA SATOSHI (JP)
FUKUSHIMA MADOKA (JP)
NISHIMURA SUZUSHI (JP)
FUKUDA MAKI (JP)
SEKI TAKASHI (JP)
TOKYO INST TECH (JP)
MASUYAMA SATOSHI (JP)
FUKUSHIMA MADOKA (JP)
NISHIMURA SUZUSHI (JP)
FUKUDA MAKI (JP)
SEKI TAKASHI (JP)
International Classes:
B29C33/38; B29C33/42; B29C39/26; B29C59/02; B82B1/00; B82Y40/00; G02B5/18; G03F7/20; H01L21/027; H01L51/50; H05B33/02; B29L11/00
Domestic Patent References:
| WO2011007878A1 | 2011-01-20 |
Foreign References:
| JP2009286008A | 2009-12-10 | |||
| JP2004358923A | 2004-12-24 | |||
| JP2010017865A | 2010-01-28 | |||
| JP2010062110W | 2010-07-16 |
Other References:
See also references of EP 2664430A4
Attorney, Agent or Firm:
KAWAKITA, KIJURO (JP)
Kijuro Kawakita (JP)
Kijuro Kawakita (JP)
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Claims:
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