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Title:
METHOD FOR PRODUCING ORIGINAL PLATE, METHOD FOR PRODUCING MICRONEEDLE PATCH, MICRONEEDLE PATCH, AND EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2008/020631
Kind Code:
A1
Abstract:
Disclosed is a method for producing an original plate, which comprises a step for forming a photoresist film on a substrate, a step for arranging a photomask having a plurality of light-shielding island portions on the photoresist film and integrating them together, a step for selectively exposing the photoresist film by irradiating it with light from a light source through the photomask, and a step for forming an original plate by developing the photoresist film. This method for producing an original plate is characterized by comprising a process wherein the photoresist film is selectively exposed by being irradiated with lights from a plurality of directions respectively through the photomask.

Inventors:
TOMONO TAKAO (JP)
Application Number:
PCT/JP2007/066043
Publication Date:
February 21, 2008
Filing Date:
August 17, 2007
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD (JP)
TOMONO TAKAO (JP)
International Classes:
G03F7/20; A61M5/31; A61M37/00
Domestic Patent References:
WO2005017623A22005-02-24
WO2004062899A22004-07-29
Foreign References:
JP2002008522A2002-01-11
JP2001235873A2001-08-31
JP2003296975A2003-10-17
JP2005199392A2005-07-28
JP2002117756A2002-04-19
JPS57200042A1982-12-08
JP2006195168A2006-07-27
JP2005246595A2005-09-15
JP2001356187A2001-12-26
Other References:
See also references of EP 2060950A4
DEVIN V. MCALLISTER ET AL., PNAS, vol. 100, no. 24, 25 November 2003 (2003-11-25), pages 13755 - 13760
SHYH-CHYI KUO ET AL., TAMKANG JOURNAL OF SCIENCE AND ENGINEERING, vol. 7, no. 2, 2004, pages 95 - 98
MOON, SANG-JUN ET AL., TRANSDUCERS '03, 3E95.P (THE 12TH INTERNATIONAL CONFERENCE ON SOLID STATE SENSORS, ACTUATORS AND MICROSYSTEMS, 8 June 2003 (2003-06-08)
Attorney, Agent or Firm:
SUZUYE, Takehiko et al. (1-12-9 Toranomo, Minato-ku Tokyo 01, JP)
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