Title:
METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT AND ASSOCIATED SEMICONDUCTOR COMPONENT, ESPECIALLY A MEMBRANE SENSOR
Document Type and Number:
WIPO Patent Application WO2003016203
Kind Code:
A3
Abstract:
The invention relates to a method for producing a semiconductor component comprising a semiconductor carrier (1). In order to form self-supporting structures (3) for a component, a flat porous membrane layer (3) and a cavity (2) beneath the porous membrane layer are produced. The aim of the invention is to avoid damaging the membrane during the production or in the event of regular use. This aim can be achieved in various ways. In a first embodiment, the semiconductor carrier (1) receives a different doping in the membrane region compared to the cavity, enabling different pore sizes and/or porosities to be produced, which can be used for improved etching gas transport during the production of the cavity. The aim of the invention can also be achieved, however, by producing mesopores in the membrane region and nanopores in the later cavity region, as auxiliary structures. The invention also relates to a semiconductor component which is based on one or a plurality of said methods.
Inventors:
BENZEL HUBERT (DE)
WEBER HERIBERT (DE)
ARTMANN HANS (DE)
PANNEK THORSTEN (DE)
SCHAFER FRANK (DE)
WEBER HERIBERT (DE)
ARTMANN HANS (DE)
PANNEK THORSTEN (DE)
SCHAFER FRANK (DE)
Application Number:
PCT/DE2002/002731
Publication Date:
March 18, 2004
Filing Date:
July 25, 2002
Export Citation:
Assignee:
BOSCH GMBH ROBERT (DE)
BENZEL HUBERT (DE)
WEBER HERIBERT (DE)
ARTMANN HANS (DE)
PANNEK THORSTEN (DE)
SCHAFER FRANK (DE)
BENZEL HUBERT (DE)
WEBER HERIBERT (DE)
ARTMANN HANS (DE)
PANNEK THORSTEN (DE)
SCHAFER FRANK (DE)
International Classes:
B81B3/00; (IPC1-7): B81B3/00; B81C1/00
Foreign References:
| DE19754513A1 | 1999-06-10 |
Other References:
DATABASE WPI Section EI Week 200038, Derwent World Patents Index; Class U12, AN 2000-432097, XP002255642
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