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Patent Searching and Data


Title:
METHOD FOR PRODUCING STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2021/033467
Kind Code:
A1
Abstract:
Provided is a method for producing a structure that can be easily bonded to a bonding target. The method for producing a structure comprises: a conductive layer forming step for forming a conductive layer having conductivity on a portion of the surface of an insulating support body having at least one surface; a valve metal layer forming step for forming a valve metal layer that covers at least a part of the conductive layer; an anodized film forming step for performing anodization using the conductive layer as an electrode, and forming, into an anodized film, a valve metal layer portion, disposed in a region on the conductive layer, of the valve metal layer; a micropore forming step for forming, on the anodized film, a plurality of micropores extending in the thickness direction; and a filling step for filling the micropores with conductive materials, wherein the method further comprises, between the anodized film forming step and the filling step, a valve metal layer removal step for removing the valve metal layer after the anodized film forming step.

Inventors:
HOTTA YOSHINORI (JP)
Application Number:
PCT/JP2020/027662
Publication Date:
February 25, 2021
Filing Date:
July 16, 2020
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
C23C28/00; C25D11/04; C25D11/20; C25D11/24; H01L21/60; H01L25/065; H01L25/07; H01L25/18
Domestic Patent References:
WO2018159186A12018-09-07
WO2019039071A12019-02-28
WO2015029881A12015-03-05
Foreign References:
JP2001143600A2001-05-25
JP2006326724A2006-12-07
JP2004014406A2004-01-15
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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