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Title:
METHOD OF REMOVING HALOGEN GAS AND REMOVER FOR HALOGEN GAS
Document Type and Number:
WIPO Patent Application WO/2007/135823
Kind Code:
A1
Abstract:
A method of halogen gas removal and a halogen gas remover which have the excellent ability to remove a halogen gas in a low-concentration region, are effective in inhibiting the adsorbent from heating up, and can reduce the amount of a solid waste to be generated. The method of halogen gas removal comprises bringing a gas to be treated which contains at least one member selected from the halogen gas group consisting of F2, Cl2, Br2, I2, and compounds which generate a hydrogen halide or hypohalgoneous acid upon hydrolysis into contact with granules comprising, based on the whole granules, 45-99.85 mass% alkali metal salt, 0.1-40 mass% carbonaceous material, and 0-15 mass%, excluding 0 mass%, alkaline earth metal salt in the presence of water to remove the halogen gas(es).

Inventors:
SAKURAI SHIGERU (JP)
ARIMA HISAKAZU (JP)
Application Number:
PCT/JP2007/058294
Publication Date:
November 29, 2007
Filing Date:
April 16, 2007
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
SAKURAI SHIGERU (JP)
ARIMA HISAKAZU (JP)
International Classes:
B01D53/68; B01J20/04; B01J20/20
Domestic Patent References:
WO2003033115A12003-04-24
WO2003033115A12003-04-24
Foreign References:
JPS63137736A1988-06-09
JP2000254438A2000-09-19
JP2004081958A2004-03-18
US6685901B22004-02-03
JP2001017831A2001-01-23
JP2006140213A2006-06-01
Other References:
See also references of EP 2022553A4
Attorney, Agent or Firm:
SENMYO, Kenji et al. (SIA Kanda Square17, Kanda-konyach, Chiyoda-ky Tokyo 35, JP)
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