Title:
METHOD AND SYSTEM FOR HIGH-RESOLUTION IMAGE INPAINTING
Document Type and Number:
WIPO Patent Application WO/2021/093620
Kind Code:
A1
Abstract:
Methods (800) and systems (105) for high-resolution image inpainting are disclosed. An original high-resolution image to be inpainted is obtained, as well as an inpainting mask indicating an inside-mask area to be inpainted (802). The original high-resolution image is down-sampled to obtain a low-resolution image to be inpainted(804). Using a trained inpainting generator (101), a low-resolution inpainted image and a set of attention scores are generated from the low-resolution image (806). The attention scores represent the similarity between inside-mask regions and outside-mask regions. A high-frequency residual image is computed from the original high-resolution image(808). An aggregated high-frequency residual image is generated using the attention scores, including high-frequency residual information for the inside-mask area (810). A high-resolution inpainted image is outputted by combining the aggregated high-frequency residual image and a low-frequency inpainted image generated from the low-resolution inpainted image (812,814).
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Inventors:
YI ZILI (CA)
TANG QIANG (CA)
AZIZI SHEKOOFEH (CA)
JANG DAESIK (CA)
XU ZHAN (CA)
TANG QIANG (CA)
AZIZI SHEKOOFEH (CA)
JANG DAESIK (CA)
XU ZHAN (CA)
Application Number:
PCT/CN2020/125669
Publication Date:
May 20, 2021
Filing Date:
October 31, 2020
Export Citation:
Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
G06T3/00
Domestic Patent References:
| WO2017075768A1 | 2017-05-11 |
Foreign References:
| CN103839242A | 2014-06-04 | |||
| CN1930890A | 2007-03-14 | |||
| US8483516B2 | 2013-07-09 | |||
| CN109791687A | 2019-05-21 | |||
| CN107133921A | 2017-09-05 |
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