Title:
MULTI CHARGED-PARTICLE BEAM IRRADIATION DEVICE AND MULTI CHARGED-PARTICLE BEAM IRRADIATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/228675
Kind Code:
A1
Abstract:
A multi charged-particle beam irradiation device according to an aspect of the present invention is characterized by comprising: a shaping aperture array substrate that forms multi-beam arrays of a charged-particle beam; a limiting aperture array substrate in which a plurality of passing holes are formed through which at least some of the beams of the multi-beam arrays can pass, some of the plurality of passing holes having a shape different from that of the other passing holes; a mechanism for moving at least one of the shaping aperture array substrate, the limiting aperture array substrate, and the multi-beam arrays in a direction orthogonal to a trajectory central axis of the multi-beams so that the relative positions of the multi-beam arrays and the limiting aperture array substrate are changed; and an optical system that irradiates a sample with a beam array among the multi-beam arrays that has passed through the limiting aperture array substrate with the relative position to the multi-beam arrays having been moved to a predetermined position.
Inventors:
MATSUMOTO HIROSHI (JP)
Application Number:
PCT/JP2023/016484
Publication Date:
November 30, 2023
Filing Date:
April 26, 2023
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
G03F7/20; H01L21/027
Foreign References:
| JP2014075409A | 2014-04-24 | |||
| JPH08153658A | 1996-06-11 | |||
| JP2021132064A | 2021-09-09 | |||
| JP2020503644A | 2020-01-30 |
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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