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Patent Searching and Data


Title:
ORGANOMETALLIC COMPOUND, SULFONIUM SALT-TYPE COMPOUND, NONION OXIME-TYPE COMPOUND, PHOTOSENSITIVE MATERIAL, ACID GENERATOR, AND PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2024/100964
Kind Code:
A1
Abstract:
Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, an aggregate that is insoluble and resistant to etching; a photosensitive material that is for photoresists and that contains the organometallic compound; and a photoresist containing the organometallic compound. An organometallic compound according to the present invention has a structure in which the following coordinative compound (2) is coordinate-bonded to a metal or metal oxide (1). Coordinative compound (2): At least one compound selected from the formulae (2-1)-(2-5).

Inventors:
SHIBAGAKI TOMOYUKI (JP)
KIZU TOMOHITO (JP)
Application Number:
PCT/JP2023/030946
Publication Date:
May 16, 2024
Filing Date:
August 28, 2023
Export Citation:
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Assignee:
SAN APRO LTD (JP)
International Classes:
C07C251/66; C07C303/06; C07C309/06; C07C309/65; C07C309/73; C07C311/02; C07C311/03; C07C321/20; C07C321/28; C07C381/12; C07D209/48; C07D221/14; C07F7/00; C07F7/22; C07F9/59; C08F2/50; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
G-CHEMICAL INTELLECTUAL PROPERTY FIRM (JP)
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