ORGANOMETALLIC COMPOUND, SULFONIUM SALT-TYPE COMPOUND, NONION OXIME-TYPE COMPOUND, PHOTOSENSITIVE MATERIAL, ACID GENERATOR, AND PHOTORESIST

WIPO Patent Application WO/2024/100964

A1

Provided are: a new organometallic compound that changes the solubility in solvents through irradiation with light beams having a ultrashort wavelength, and that forms, when being exposed with light beams having a ultrashort wavelength, an aggregate that is insoluble and resistant to etching; a photosensitive material that is for photoresists and that contains the organometallic compound; and a photoresist containing the organometallic compound.　An organometallic compound according to the present invention has a structure in which the following coordinative compound (2) is coordinate-bonded to a metal or metal oxide (1). Coordinative compound (2): At least one compound selected from the formulae (2-1)-(2-5).

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SHIBAGAKI TOMOYUKI (JP)
KIZU TOMOHITO (JP)

PCT/JP2023/030946

May 16, 2024

August 28, 2023

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SAN APRO LTD (JP)

C07C251/66; C07C303/06; C07C309/06; C07C309/65; C07C309/73; C07C311/02; C07C311/03; C07C321/20; C07C321/28; C07C381/12; C07D209/48; C07D221/14; C07F7/00; C07F7/22; C07F9/59; C08F2/50; C09K3/00; G03F7/004; G03F7/039; G03F7/20

G-CHEMICAL INTELLECTUAL PROPERTY FIRM (JP)

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