Title:
PARTICLE ANALYSIS DEVICE, PARTICLE ANALYSIS METHOD, AND OPTICAL MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/153736
Kind Code:
A1
Abstract:
A particle analysis device (100) comprises: a light source that emits excitation light (EL1) including light with wavelengths of 400 nm or less; a lens structure (41) that concentrates the excitation light (EL1) onto a predetermined position (51s) in a flow path (53); a detection unit (7) that detects light (FL) radiated from a particle (51) flowing through the predetermined position by the particle being excited by the excitation light (EL1); and a processing unit (120) that processes detection data acquired by the detection unit (7). The lens structure (41) comprises a plurality of lenses (411) arranged along the optical axis of the excitation light (EL1), and a lens frame (412) that holds the plurality of lenses (411), and the position within the lens frame (412) of at least one lens (G12) among the plurality of lenses (411) is determined by the one lens being brought into contact with a lens adjacent thereto.
Inventors:
HATAKEYAMA TAKESHI (JP)
NAGAE SATOSHI (JP)
NONAKA MASANOBU (JP)
ISHIDA KENJI (JP)
KIKUCHI NAOMICHI (JP)
KATO TAKASHI (JP)
NAGAE SATOSHI (JP)
NONAKA MASANOBU (JP)
ISHIDA KENJI (JP)
KIKUCHI NAOMICHI (JP)
KATO TAKASHI (JP)
Application Number:
PCT/JP2021/045300
Publication Date:
July 21, 2022
Filing Date:
December 09, 2021
Export Citation:
Assignee:
SONY GROUP CORP (JP)
International Classes:
G02B21/02; G01N15/14; G01N21/05; G01N21/64; G02B21/00
Domestic Patent References:
| WO2016185623A1 | 2016-11-24 |
Foreign References:
| JP2003090945A | 2003-03-28 | |||
| JP4252447B2 | 2009-04-08 | |||
| JP2004219608A | 2004-08-05 | |||
| JP2015038539A | 2015-02-26 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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