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Patent Searching and Data


Title:
PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/193577
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a pattern formation method which uses a non-chemically amplified resist composition and has excellent cleaning ability in a cleaning step by means of an EBR solution, and in which film loss is less likely to occur in an unexposed area during the development using an organic solvent-based developer. The present invention addresses another problem of providing a method for manufacturing an electronic device by using said pattern formation method. A pattern forming method according to the present invention includes: a resist film forming step in which a resist film is formed on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition; a cleaning step in which the outer peripheral portion of the substrate is cleaned with an organic solvent-containing cleaning solution while rotating the substrate on which the resist film has been formed; an exposure step in which the resist film is exposed; and a development step in which positive development is performed on the exposed resist film by using an organic solvent-based developer. The actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin having a polar group; a compound including ion pairs decomposed by being irradiated with active rays or radiation; and a solvent, wherein all expressions (1)-(4) are satisfied.

Inventors:
MARUMO KAZUHIRO (JP)
SHIRAKAWA MICHIHIRO (JP)
TAKADA AKIRA (JP)
Application Number:
PCT/JP2021/011824
Publication Date:
September 30, 2021
Filing Date:
March 23, 2021
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F12/24; G03F7/00; G03F7/004; G03F7/038; G03F7/16; G03F7/20; G03F7/32
Foreign References:
JP2013142763A2013-07-22
JP2002141265A2002-05-17
JP2004045491A2004-02-12
JP2005202363A2005-07-28
JP2006085140A2006-03-30
JP2007178589A2007-07-12
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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