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Title:
PATTERN-FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/192768
Kind Code:
A1
Abstract:
　This pattern-forming method is characterized by including the following steps: a step in which an actinic ray-sensitive or radiation-sensitive resin composition containing a resin, the solvability of which in an organic solvent decreases as a result of the action of acid, a solvent, and a compound that generates a component that forms ionic bonds with polar groups in the resin, is applied onto a substrate to form an actinic ray-sensitive or radiation-sensitive film; a step in which the actinic ray-sensitive or radiation-sensitive film is exposed; and a step in which the exposed actinic ray-sensitive or radiation-sensitive film is developed using a developer including an organic solvent, to form a negative pattern.

Inventors:
FURUTANI HAJIME (JP)
GOTO AKIYOSHI (JP)
SHIRAKAWA MICHIHIRO (JP)
YOSHIDOME MASAHIRO (JP)
Application Number:
PCT/JP2014/064021
Publication Date:
December 04, 2014
Filing Date:
May 27, 2014
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/38; H01L21/027
Foreign References:
JP2012032806A2012-02-16
JP2012078797A2012-04-19
JP2011209501A2011-10-20
JP2011008237A2011-01-13
JP2011095635A2011-05-12
JP2013064988A2013-04-11
JP2013257553A2013-12-26
JP2014037386A2014-02-27
JP2014074896A2014-04-24
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)
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