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Patent Searching and Data


Title:
PATTERNED CNT FILM-COATED SUBSTRATE USING CLICK REACTION AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/191535
Kind Code:
A1
Abstract:
A patterned CNT film-coated substrate, according to the present invention, can have high stability against water or an organic solvent as a CNT film is uniformly formed at high density by using a click reaction. In particular, conventionally, a CNT-based film patterned by chemical vapor deposition (CVD) or spray coating and spin coating is easily peeled off, and thus, a difference in physical properties between devices is large and it is difficult to secure reproducibility and reliability, whereas, in the present invention, it is possible to manufacture a patterned CNT film-coated substrate having high reproducibility and reliability by means of a relatively simple method, and by using same, it is possible to form various types of patterns suitable for industrial fields for semiconductors, displays, and electronic devices.

Inventors:
LIM BOGYU (KR)
PARK JONG MOK (KR)
JUNG SEO HYUN (KR)
JUNG YU JIN (KR)
KIM YE JIN (KR)
JEON SEUNG JU (KR)
KIM GA YOUNG (KR)
LEE HYE MIN (KR)
Application Number:
PCT/KR2023/004257
Publication Date:
October 05, 2023
Filing Date:
March 30, 2023
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KOREA RES INST CHEMICAL TECH (KR)
International Classes:
C09D133/06; B05D1/32; B05D3/00; B05D7/00; C08K3/04; C08K9/04; C09D7/61; C09D145/00
Foreign References:
KR20140033555A2014-03-19
KR20130054982A2013-05-27
KR101937608B12019-01-11
KR101358941B12014-02-27
KR102488388B12023-01-13
Other References:
FONG DARRYL, ANDREWS GRACE M., ADRONOV ALEX: "Functionalization of polyfluorene-wrapped carbon nanotubes via copper-mediated azide–alkyne cycloaddition", POLYMER CHEMISTRY, ROYAL SOCIETY OF CHEMISTRY, CAMBRIDGE, vol. 9, no. 21, 1 January 2018 (2018-01-01), Cambridge , pages 2873 - 2879, XP093096142, ISSN: 1759-9954, DOI: 10.1039/C8PY00377G
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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