PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME - AZ ELECTRONIC MATERIALS LUXEMBOURG S A R I

Title:

PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME

Document Type and Number:

WIPO Patent Application WO/2015/087847

Kind Code:

A1

Abstract:

[Problem] To provide a perhydropolysilazane making it possible to form a silica film with minimal defects, and a curing composition containing the perhydropolysilazane. [Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5000-17000, characterized in that when 1H-NMR of a 17% by weight solution of the perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 relative to the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH relative to the aromatic ring hydrogen content of the xylol is 0.055 or less. The present invention also provides a method for forming a silica film, the method including applying the curing composition on a substrate and applying heat.

Inventors:

OKAMURA TOSHIYA (JP)
KANDA TAKASHI (JP)
SAKURAI ISSEI (JP)
BARNICKEL BERND BERTRAM (JP)
AOKI HIROYUKI (JP)

Application Number:

PCT/JP2014/082468

Publication Date:

June 18, 2015

Filing Date:

December 08, 2014

Export Citation:

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Assignee:

AZ ELECTRONIC MATERIALS LUXEMBOURG S A R I (LU)

International Classes:

H01L21/316; C01B21/082

Domestic Patent References:

WO2011027826A1

2011-03-10

Foreign References:

JPH01138107A	1989-05-31
JP2011142207A	2011-07-21
JP2005150702A	2005-06-09
JP2009511670A	2009-03-19
JP2013162072A	2013-08-19
US20120164382A1	2012-06-28
US20120177829A1	2012-07-12
US20130017662A1	2013-01-17
JP2613787B2	1997-05-28
JP2651464B2	1997-09-10

Other References: