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Title:
PHOTO-ACID GENERATOR AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2020/105364
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a non-ionic photo-acid generator which exhibits high photosensitivity to i-rays, excellent compatibility with, and solubility in, a resist solution, and excellent thermal stability. The present invention is a non-ionic photo-acid generator that is characterized by being represented by general formula (1). [In formula (1), X denotes an oxygen atom or a sulfur atom, R1 denotes a hydrogen atom or a C1-12 alkyl group that may have a carboxylic acid group, R2 denotes a hydrogen atom or a C1-12 alkyl group, and Rf denotes a C1-12 hydrocarbon group in which some or all of the hydrogen atoms are substituted with fluorine atoms.]

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Inventors:
SHIBAGAKI TOMOYUKI (JP)
Application Number:
PCT/JP2019/041871
Publication Date:
May 28, 2020
Filing Date:
October 25, 2019
Export Citation:
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Assignee:
SAN APRO LTD (JP)
International Classes:
C09K3/00; G03F7/004; C07D221/14
Domestic Patent References:
WO2016043558A12016-03-24
WO2018110399A12018-06-21
WO2019216174A12019-11-14
Foreign References:
JP2017535595A2017-11-30
JP2018112670A2018-07-19
JP2018091939A2018-06-14
JP2018523640A2018-08-23
JP2017037300A2017-02-16
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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