Title:
PHOTO MASK, PATTERN FORMATION METHOD USING THE SAME, AND MASK DATA GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2005/040919
Kind Code:
A1
Abstract:
A pattern (121) arranged as a mask pattern on a transparent substrate (100) has partial patterns (121A and 121B). Each of the partial patterns (121A and 121B) has a mask enhancer structure consisting of a phase shifter (102) for transmitting the exposure light with a reverse phase using the light transmission section as a reference and a light shielding section (101) surrounding the phase shifter (102). The partial pattern (121A) is in the proximity with other patterns (122, 123) at a distance not greater than a predetermined value so as to sandwich the light transmission section. The width of the phase shifter (102A) of the partial pattern (121A) is smaller than the width of the phase shifter (102B) of the partial pattern (121B).
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Inventors:
MISAKA AKIO
Application Number:
PCT/JP2004/014143
Publication Date:
May 06, 2005
Filing Date:
September 21, 2004
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD (JP)
MISAKA AKIO
MISAKA AKIO
International Classes:
G03F1/29; G03F1/36; G03F1/68; G03F7/20; G06F17/50; H01L21/027; (IPC1-7): G03F1/08; G06F17/50; H01L21/027
Domestic Patent References:
| WO2002091079A1 | 2002-11-14 | |||
| WO2001035166A1 | 2001-05-17 |
Foreign References:
| JPH0822114A | 1996-01-23 | |||
| JPH03170928A | 1991-07-24 | |||
| US5718829A | 1998-02-17 | |||
| EP0401795A2 | 1990-12-12 | |||
| JP2001174974A | 2001-06-29 |
Attorney, Agent or Firm:
Maeda, Hiroshi (5-7 Hommachi 2-chome, Chuo-k, Osaka-shi Osaka 53, JP)
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