Title:
PHOTO VOLTAIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/001863
Kind Code:
A1
Abstract:
A photo voltaic device is provided with a semiconductor substrate (10), an i-type amorphous layer (12i) or an i-type amorphous layer (16i) formed on the front surface or the rear surface of the semiconductor substrate (10), a p-type amorphous layer (12p) or an n-type amorphous layer (16n) formed on the i-type amorphous layer (12i) or the i-type amorphous layer (16i). The i-type amorphous layer (12i) or the i-type amorphous layer (16i) has oxygen concentration profiles wherein the concentration is decreased in a film thickness direction in a stepwise pattern from near the boundary face with the semiconductor substrate (10).
Inventors:
OGANE AKIYOSHI (JP)
TSUNOMURA YASUFUMI (JP)
TSUNOMURA YASUFUMI (JP)
Application Number:
PCT/JP2012/057140
Publication Date:
January 03, 2013
Filing Date:
March 21, 2012
Export Citation:
Assignee:
SANYO ELECTRIC CO (JP)
OGANE AKIYOSHI (JP)
TSUNOMURA YASUFUMI (JP)
OGANE AKIYOSHI (JP)
TSUNOMURA YASUFUMI (JP)
International Classes:
H01L31/04
Foreign References:
| JP2002329878A | 2002-11-15 | |||
| JP2008235400A | 2008-10-02 | |||
| JP2004014812A | 2004-01-15 | |||
| JP4070483B2 | 2008-04-02 | |||
| JP2008235400A | 2008-10-02 |
Other References:
J. APPL. PHYS., vol. 107, 2010, pages 014504
APPL. PHYS. LETT., vol. 91, 2007, pages 133508
APPL. PHYS. LETT., vol. 91, 2007, pages 133508
Attorney, Agent or Firm:
YKI Patent Attorneys (JP)
Patent business corporation YKI international patent firm (JP)
Patent business corporation YKI international patent firm (JP)
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