Title:
PHOTOACID GENERATOR AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2018/110399
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a non-ionic photoacid generator having high photosensitivity to an i-line, and excellent heat-resistance stability, solubility in hydrophobic materials, and alkali developability. The present invention is a non-ionic photoacid generator (A) characterized by being represented by formula (1). [In formula (1), X is a monovalent organic group that is desorbed by the action of an acid and can be substituted by a hydrogen atom, and Rf is a C1-18 hydrocarbon group (all or part of the hydrogen may be replaced by fluorine).]
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Inventors:
NAKAMURA YUJI (JP)
SHIBAGAKI TOMOYUKI (JP)
SHIBAGAKI TOMOYUKI (JP)
Application Number:
PCT/JP2017/043929
Publication Date:
June 21, 2018
Filing Date:
December 07, 2017
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
G03F7/004; C09K3/00; G03F7/20; C07D221/14
Domestic Patent References:
| WO2015001804A1 | 2015-01-08 | |||
| WO2016043941A1 | 2016-03-24 | |||
| WO2011087011A1 | 2011-07-21 | |||
| WO2015046501A1 | 2015-04-02 |
Foreign References:
| JP2014186309A | 2014-10-02 | |||
| JP2004217748A | 2004-08-05 |
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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