PHOTOMASK, OPTICAL WAVEGUIDE, OPTICAL CIRCUIT, AND OPTICAL WAVEGUIDE MANUFACTURING METHOD

Title:

PHOTOMASK, OPTICAL WAVEGUIDE, OPTICAL CIRCUIT, AND OPTICAL WAVEGUIDE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2022/029939

Kind Code:

A1

Abstract:

Provided is an optical waveguide having little optical loss at a connection portion, in an optical circuit divided into a plurality of sub-circuits. Further provided is a photomask (110) in which a waveguide pattern of an optical circuit is divided into a plurality of regions and drawn. In order to connect the waveguide that is divided and drawn, the waveguide is provided with a waveguide pattern for drawing a junction region (112) in which the waveguide width changes toward an outer peripheral section (113). The waveguide is connected by overlapping and exposing the junction regions of two photomasks.

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Inventors:

GO TAKASHI (JP)
YANAGIHARA AI (JP)
YAMAGUCHI KEITA (JP)
SUZUKI KENYA (JP)

Application Number:

PCT/JP2020/030071

Publication Date:

February 10, 2022

Filing Date:

August 05, 2020

Export Citation:

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Assignee:

NIPPON TELEGRAPH & TELEPHONE (JP)

International Classes:

G02B6/13; G03F9/00; G03F1/42

Foreign References:

JP2005534964A	2005-11-17
US20070297715A1	2007-12-27
US20160359568A1	2016-12-08