Title:
PHOTORESIST PROTECTIVE MATERIAL AND METHOD FOR USING SAME TO FORM METAL GRID
Document Type and Number:
WIPO Patent Application WO/2023/065801
Kind Code:
A1
Abstract:
A photoresist protective material and a method for using same to form a metal grid. The photoresist protective material comprises the following components: (A) a defoamer; (B) a surfactant; (C) a leveling agent; (D) a polyenol; (E) highly chemically inert transparent polymer particles; and (F) deionized water. The photoresist protective material has excellent anti-adhesive properties, can reduce contamination on the surface of a photomask during a contact exposure process, and does not cause the photomask to become sticky in a contact mask UV exposure process. In the exposure process after coating, the curing effect on a UV light-curable layer will not be affected due to introduced particles.
Inventors:
LI YANG (CN)
WANG JUN (CN)
JIANG JIANGUO (CN)
WANG JUN (CN)
JIANG JIANGUO (CN)
Application Number:
PCT/CN2022/113513
Publication Date:
April 27, 2023
Filing Date:
August 19, 2022
Export Citation:
Assignee:
FLEXTOUCH TECH CO LTD (CN)
International Classes:
C09D7/65; C09D127/18; G03F7/20; C09D129/04; G03F7/30
Domestic Patent References:
| WO1998013394A1 | 1998-04-02 |
Foreign References:
| CN113501992A | 2021-10-15 | |||
| CN113485581A | 2021-10-08 | |||
| CN113845805A | 2021-12-28 | |||
| US20130059252A1 | 2013-03-07 |
Attorney, Agent or Firm:
ZHONG LUN LAW FIRM (CN)
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