PHOTOSENSITIVE COMPOSITION AND CURED FILM OF SAME

Title:

PHOTOSENSITIVE COMPOSITION AND CURED FILM OF SAME

Document Type and Number:

WIPO Patent Application WO/2015/194639

Kind Code:

A1

Abstract:

Provided are: a photosensitive composition which exhibits sufficient adhesion to a base even in cases where film formation on the base is carried out at low temperatures; and a cured film of the photosensitive composition. A photosensitive composition according to the present invention contains (A) an acrylic resin, (B) a silane coupling agent and (C) a photopolymerizable compound. The silane coupling agent (B) is a silane compound that is a reaction product of a silicon compound represented by general formula (1) and having an isocyanate group and a silicon compound represented by general formula (2).

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Inventors:

KUMANDA MAKOTO (JP)
UEMURA KAZUKI (JP)
KATAE HIDEKI (JP)

Application Number:

PCT/JP2015/067632

Publication Date:

December 23, 2015

Filing Date:

June 18, 2015

Export Citation:

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Assignee:

OSAKA ORGANIC CHEM IND (JP)

International Classes:

G03F7/075; C08K5/5455; C08L63/00; G03F7/033

Domestic Patent References:

WO2014104195A1	2014-07-03
WO2011114995A1	2011-09-22

Foreign References:

JP2002179688A	2002-06-26
JP2004010697A	2004-01-15
JP2002212192A	2002-07-31

Attorney, Agent or Firm:

ASAHINA & CO. (JP)
Patent business corporation ASAHINA & CO. Patent Attotneys (JP)

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