Title:
PHOTOSENSITIVE COMPOSITION FOR FORMING COLOR RESIST, METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, AND COLOR FILTER SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/114293
Kind Code:
A1
Abstract:
Embodiments of the present disclosure relate to a photosensitive composition for forming a color resist, a method for manufacturing a color filter substrate, and a color filter substrate. The photosensitive composition comprises at least two color resist precursors and at least two photoinitiators. Each of the at least two photoinitiators is used for initiating a polymerization reaction of a corresponding one of the at least two color resist precursors so as to form the color resist.
Inventors:
ZHONG GUOQIANG (CN)
DONG ANXIN (CN)
YIN RUI (CN)
YU YA (CN)
TANG WENHAO (CN)
DONG ANXIN (CN)
YIN RUI (CN)
YU YA (CN)
TANG WENHAO (CN)
Application Number:
PCT/CN2018/099212
Publication Date:
June 20, 2019
Filing Date:
August 07, 2018
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G02F1/1335; G03F7/027
Foreign References:
| CN104194399A | 2014-12-10 | |||
| CN1629699A | 2005-06-22 | |||
| CN106977665A | 2017-07-25 | |||
| CN104212201A | 2014-12-17 | |||
| US8673272B2 | 2014-03-18 |
Other References:
See also references of EP 3739380A4
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (CN)
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