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Title:
PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2006/109454
Kind Code:
A1
Abstract:
Disclosed is a photosensitive lithographic printing plate comprising a supporting body and a photosensitive layer containing a photopolymerizable compound. This photosensitive lithographic printing plate is characterized by having a foundation layer arranged between the photosensitive layer and the supporting body and containing a (co)polymer having a constitutional unit including an ethylenically unsaturated group bonded to a silicon atom and a phosphonic acid group.

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JP2023171431PLANOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD
Inventors:
HAYASHI KOJI (JP)
HAYAKAWA EIJI (JP)
Application Number:
PCT/JP2006/305619
Publication Date:
October 19, 2006
Filing Date:
March 15, 2006
Export Citation:
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Assignee:
KODAK POLYCHROME GRAPHICS JP (JP)
HAYASHI KOJI (JP)
HAYAKAWA EIJI (JP)
International Classes:
G03F7/00; G03F7/11
Foreign References:
JPH11174666A1999-07-02
JPH0485541A1992-03-18
JP2003072253A2003-03-12
JP2003057831A2003-02-28
JPH10161316A1998-06-19
JPS6084310A1985-05-13
JPS61127764A1986-06-16
Other References:
See also references of EP 1865378A4
None
Attorney, Agent or Firm:
Aoki, Atsushi (Toranomon 37 Mori Bldg. 5-1, Toranomon 3-chome, Minato-k, Tokyo 23, JP)
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