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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING LIGHT SHIELDING LAYER, LIGHT SHIELDING LAYER AND COLOR FILTER
Document Type and Number:
WIPO Patent Application WO/2006/090590
Kind Code:
A1
Abstract:
A photosensitive resin composition for forming a light shielding layer is a photosensitive resin composition for forming a light shielding layer with a film thickness of more than 2 µm, comprising (A) a light shielding pigment, (B) an alkali soluble resin, (C) a photopolymerizable compound and (D) a photopolymerization initiator, and is characterized in that the (A) light shielding pigment comprises a perylene black pigment.

Inventors:
OHNISHI HIROYUKI (JP)
MARUYAMA KENJI (JP)
UCHIKAWA KIYOSHI (JP)
Application Number:
PCT/JP2006/302234
Publication Date:
August 31, 2006
Filing Date:
February 09, 2006
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
OHNISHI HIROYUKI (JP)
MARUYAMA KENJI (JP)
UCHIKAWA KIYOSHI (JP)
International Classes:
G03F7/004; G02B5/20
Foreign References:
JP2003139938A2003-05-14
JP2003105226A2003-04-09
JP2004346218A2004-12-09
JP2004347916A2004-12-09
Attorney, Agent or Firm:
Tanai, Sumio (Yaesu Chuo-k, Tokyo 53, JP)
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