Title:
PHOTOSENSITIVE RESIN COMPOSITION, POLYMER, PATTERN, COLOR FILTER, BLACK MATRIX, DISPLAY DEVICE AND IMAGING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2020/158741
Kind Code:
A1
Abstract:
The invention provides a photosensitive resin composition containing a polymer having a first structural unit represented by general formula (1), and having an acid value of 70 to 300 mg KOH/g and a double bond equivalent of 100 to 500 g/mol. In addition, the invention provides a polymer having a first structural unit represented by general formula (1), and having an acid value of 70 to 300 mg KOH/g and a double bond equivalent of 100 to 500 g/mol. In general formula (1), RD represents a group containing a polymeric carbon-carbon double bond.
Inventors:
TANABE JUNICHI (JP)
KUBOYAMA TOSHIHARU (JP)
KUBOYAMA TOSHIHARU (JP)
Application Number:
PCT/JP2020/003004
Publication Date:
August 06, 2020
Filing Date:
January 28, 2020
Export Citation:
Assignee:
SUMITOMO BAKELITE CO (JP)
International Classes:
C08F8/14; C08F20/08; G02B5/20; G02F1/1335; G03F7/004; G03F7/038
Domestic Patent References:
| WO2011129182A1 | 2011-10-20 |
Foreign References:
| JP2018197833A | 2018-12-13 | |||
| JP2011033951A | 2011-02-17 | |||
| JP2014160228A | 2014-09-04 |
Attorney, Agent or Firm:
HAYAMI Shinji (JP)
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