Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PLASMA GENERATOR AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/153060
Kind Code:
A1
Abstract:
A plasma generator provided with an electrode group and a dielectric substance. The dielectric substance has a first principal plane and a second principal plane on the side opposite the first principal plane. The electrode group includes at least one first electrode and at least one second electrode which are encapsulated by the dielectric substance and are arranged in alternating fashion in an arrangement plane that is parallel to the first principal plane, the effect of the electric field between a first electrode 21a and a second electrode 21b generated by application of a high-frequency voltage being directed outwardly with respect to a first principal plane 3a.

More Like This:
JP2868120[Title of Invention] Electron Beam Excited Plasma Generator
WO/2014/069915OXYGEN SENSOR HAVING POROUS CERAMIC COATING LAYER FORMED THEREON AND METHOD FOR FORMING POROUS CERAMIC COATING LAYER
WO/2003/092338METHOD FOR GENERATING A COLD PLASMA FOR STERILIZING A GASEOUS MEDIUM AND DEVICE THEREFOR
Inventors:
HORIKOSHI AKIRA (JP)
NAKAMURA SHOHEI (JP)
TAKATSUJI SHIGERU (JP)
KIMURA TAKAHIRO (JP)
Application Number:
PCT/JP2020/046897
Publication Date:
August 05, 2021
Filing Date:
December 16, 2020
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H05H1/24; A01G7/04; H01L21/027; H01L21/304
Foreign References:
US20180374685A12018-12-27
JP2008028365A2008-02-07
JP2016207322A2016-12-08
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: ELECTROSTATIC INPUT DEVICE

Next Patent: INSPECTION SOCKET