Title:
PLASMA IRRADIATION APPARATUS AND PLASMA TREATMENT LIQUID MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/073878
Kind Code:
A1
Abstract:
An atmospheric pressure plasma irradiation apparatus 10 comprises: a cover housing 22 that demarcates a predetermined space; a plasma generation device 20 that ejects plasma to the inside of the cover housing 22; a purge gas supply mechanism 32 that supplies gas to the inside of the cover housing 22; a stage 26 that is provided in the inside of the cover housing 22 and that holds a treatment target liquid; a duct port 160 which is provided in a lower part of the cover housing 22 and through which gas is discharged from the inside of the cover housing 22; and a liquid reservoir part 151 that is provided at the lower side of the duct port 160 and that stores a portion of the treatment target liquid having leaked from the stage 26.
Inventors:
IKEDO TOSHIYUKI (JP)
JINDO TAKAHIRO (JP)
JINDO TAKAHIRO (JP)
Application Number:
PCT/JP2021/039874
Publication Date:
May 04, 2023
Filing Date:
October 28, 2021
Export Citation:
Assignee:
FUJI CORP (JP)
International Classes:
H05H1/24
Domestic Patent References:
| WO2017037775A1 | 2017-03-09 |
Foreign References:
| JP2000208502A | 2000-07-28 | |||
| JP2004530462A | 2004-10-07 |
Attorney, Agent or Firm:
NEXT INTERNATIONAL et al. (JP)
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