Title:
PLASMA TREATMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2015/156156
Kind Code:
A1
Abstract:
In this plasma treatment system, a coefficient (K) serving as the minimum amount of water required to generate plasma is provided, said coefficient being the ratio of the supply amount of physiological saline to the suction amount of the physiological saline. Furthermore, in the plasma treatment system, the required supply amount and suction amount of the physiological saline are set from the coefficient (K) obtained on the basis of the high-frequency-energy output level, and plasma treatment is executed.
Inventors:
ISHIKAWA MANABU (JP)
KIMURA SHUICHI (JP)
WATANABE KOICHIRO (JP)
KIMURA SHUICHI (JP)
WATANABE KOICHIRO (JP)
Application Number:
PCT/JP2015/059754
Publication Date:
October 15, 2015
Filing Date:
March 27, 2015
Export Citation:
Assignee:
OLYMPUS CORP (JP)
International Classes:
A61B18/12
Domestic Patent References:
| WO2013157408A1 | 2013-10-24 |
Foreign References:
| JP2011528950A | 2011-12-01 | |||
| JP2011229956A | 2011-11-17 | |||
| JP5167443B2 | 2013-03-21 | |||
| JP2008136843A | 2008-06-19 | |||
| JPH11501555A | 1999-02-09 |
Other References:
See also references of EP 3130303A4
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)
Masatoshi Kurata (JP)
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