Title:
PLASMA UNIFORMITY CONTROL SYSTEM USING MULTI-PULSING AND CONTROL METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2023/043042
Kind Code:
A1
Abstract:
A plasma uniformity control system according to one embodiment comprises: a plasma generation unit for generating plasma by applying pulse power to plasma source gas; an ion supply unit connected to the plasma generation unit and receiving and accommodating the plasma generated by the plasma generation unit; a plurality of split electrodes located inside or under the ion supply unit, electrically isolated from each other, and having individually applied voltages, respectively; and a control unit for controlling the supply amount of ions moving from the ion supply unit to each of the plurality of split electrodes.
Inventors:
HUH SUNG RYUL (KR)
Application Number:
PCT/KR2022/010856
Publication Date:
March 23, 2023
Filing Date:
July 25, 2022
Export Citation:
Assignee:
KOREA ATOMIC ENERGY RES (KR)
International Classes:
H01J37/32
Foreign References:
| KR101886755B1 | 2018-08-09 | |||
| KR100395272B1 | 2003-11-03 | |||
| KR20090015392A | 2009-02-12 | |||
| KR20200032276A | 2020-03-25 | |||
| US20030079983A1 | 2003-05-01 | |||
| KR101886755B1 | 2018-08-09 | |||
| KR101465542B1 | 2014-11-26 | |||
| KR100485034B1 | 2005-04-25 | |||
| KR101328800B1 | 2013-11-13 |
Attorney, Agent or Firm:
YOU ME PATENT AND LAW FIRM (KR)
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