Title:
POLYETHER ETHER KETONE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2022/230934
Kind Code:
A1
Abstract:
A polyether ether ketone which comprises a repeating unit represented by formula (1) and a terminal structure represented by formula (2).
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Inventors:
NAMIKI SOSHI (JP)
FUJITA TAKEHIRO (JP)
KUMAGAI HIROMU (JP)
HOSHI YUKO (JP)
FUJITA TAKEHIRO (JP)
KUMAGAI HIROMU (JP)
HOSHI YUKO (JP)
Application Number:
PCT/JP2022/019066
Publication Date:
November 03, 2022
Filing Date:
April 27, 2022
Export Citation:
Assignee:
IDEMITSU KOSAN CO (JP)
International Classes:
C08G65/46; C08G65/48
Domestic Patent References:
WO2002000270A1 | 2002-01-03 | |||
WO2002002158A1 | 2002-01-10 |
Foreign References:
EP1170318A1 | 2002-01-09 | |||
CN107815056A | 2018-03-20 | |||
JP2013500350A | 2013-01-07 | |||
JP2021050314A | 2021-04-01 | |||
CN111943831A | 2020-11-17 | |||
CN106750258A | 2017-05-31 |
Other References:
COLQUHOUN HOWARD, LIONEL G. SESTIAA, DAVID J. WILLIAMS, MIKHAIL G. ZOLOTUKHIN : "Macro-Ring-Functionalised Poly(ether ether ketone): A New Molecular Architecture for Aromatic Polymers.", MACROMOLECULAR RAPID COMMUNICATIONS, WILEY-VCH, DE, vol. 23, no. 10/11, 12 July 2002 (2002-07-12), DE , pages 634 - 638, XP055981393, ISSN: 1022-1336, DOI: 10.1002/1521-3927(20020701)23:10/11<634::AID-MARC634>3.0.CO;2-U
JONAS ALAIN, LEGRAS ROGER, DEVAUX JACQUES: "PEEK oligomers: a model for the polymer physical behavior. 1. Synthesis and characterization of linear monodisperse oligomers", MACROMOLECULES, AMERICAN CHEMICAL SOCIETY, US, vol. 25, no. 21, 1 October 1992 (1992-10-01), US , pages 5841 - 5850, XP055981399, ISSN: 0024-9297, DOI: 10.1021/ma00047a042
JONAS ALAIN, LEGRAS ROGER, DEVAUX JACQUES: "PEEK oligomers: a model for the polymer physical behavior. 1. Synthesis and characterization of linear monodisperse oligomers", MACROMOLECULES, AMERICAN CHEMICAL SOCIETY, US, vol. 25, no. 21, 1 October 1992 (1992-10-01), US , pages 5841 - 5850, XP055981399, ISSN: 0024-9297, DOI: 10.1021/ma00047a042
Attorney, Agent or Firm:
HEIWA INTERNATIONAL PATENT OFFICE (JP)
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