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Patent Searching and Data


Title:
POLYIMIDE CONTAINING SILICATE GROUPS
Document Type and Number:
WIPO Patent Application WO/1995/033000
Kind Code:
A1
Abstract:
The invention provides a novel polyimide containing silicate groups, which is excellent in mechanical and electrical properties, heat resistance and also the formability into film, and a film-forming heat-resistant material excellent in solvent and bending resistances and bondability. The polyimide has repeating units each represented by general formula (1) and is produced from a tetracarboxylic acid anhydride and a diamine having at least one alkyl silicate group as the side-chain substituent. In said formula (1) Ar1 represents a tetravalent organic group; R1 and R2 are absent or each represents C1-C4 alkylene or phenylene; R3 to R7, R9 and R10 represent each C1-C6 hydrocarbyl; R8 represents ethylene or C3-C6 alkylene; m and n represent each independently an integer of 1 to 10; and k represents an integer of 0 to 2.

Inventors:
FURUKAWA NOBUYUKI (JP)
FUJIYAMA TAKESHI (JP)
YUASA MASATOSHI (JP)
Application Number:
PCT/JP1995/001039
Publication Date:
December 07, 1995
Filing Date:
May 30, 1995
Export Citation:
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Assignee:
NIPPON STEEL CHEMICAL CO (JP)
FURUKAWA NOBUYUKI (JP)
FUJIYAMA TAKESHI (JP)
YUASA MASATOSHI (JP)
International Classes:
C08G73/10; C08G77/42; C08G77/455; C08G77/50; C08G77/54; (IPC1-7): C08G73/10; C08G77/455
Foreign References:
JPH01204931A1989-08-17
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