Title:
POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
Document Type and Number:
WIPO Patent Application WO/2011/042770
Kind Code:
A8
Abstract:
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is (7) wherein W is selected from (Ci-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n > 2. The invention further relates to a process for using such a composition.
More Like This:
Inventors:
DAMMEL RALPH R (TH)
CHAKRAPANI SRINIVASAN (US)
PADMANABAN MUNIRATHNA (US)
MIYAZAKI SHINJI (JP)
NG EDWARD W (US)
KUDO TAKANORI (US)
DIOSES ALBERTO D (US)
HOULIHAN FRANCIS M (US)
CHAKRAPANI SRINIVASAN (US)
PADMANABAN MUNIRATHNA (US)
MIYAZAKI SHINJI (JP)
NG EDWARD W (US)
KUDO TAKANORI (US)
DIOSES ALBERTO D (US)
HOULIHAN FRANCIS M (US)
Application Number:
PCT/IB2009/007456
Publication Date:
June 30, 2011
Filing Date:
November 12, 2009
Export Citation:
Assignee:
AZ ELECTRONIC MATERIALS USA (US)
International Classes:
G03F7/09
Download PDF: