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Title:
PREPARATION METHOD AND SYSTEM FOR JOSEPHSON JUNCTION
Document Type and Number:
WIPO Patent Application WO/2023/246326
Kind Code:
A1
Abstract:
A preparation method and system for a Josephson junction, relating to the technical field of micro-nano processing. The preparation method for the Josephson junction comprises: preparing a circuit structure on a substrate in a manner of nano-imprint lithography (201), the circuit structure comprising a first lead, a second lead and a peripheral circuit; preparing a photoresist-based undercut structure on the substrate (202), the undercut structure being of a stripe-shaped structure, a first area and a second area having upper layers of photoresist and lower layers being hollowed out, and the second area being a perforated area of the undercut structure; preparing an oxide layer on the surface, which is not covered by the photoresist, of the second lead (203); in a direction from the first area to the second area, carrying out tilted evaporation to form a first superconducting layer so as to obtain a Josephson junction (204); and in a direction from the second area to the first area, carrying out tilted evaporation to form a second superconducting layer (205). The present solution can avoid introducing parasitic junctions, so that the decoherence of a quantum bit assembly is improved, and the performance of a quantum computing device is further improved.

Inventors:
LI DENGFENG (CN)
ZHANG WENLONG (CN)
DAI MAOCHUN (CN)
BU KUNLIANG (CN)
Application Number:
PCT/CN2023/092199
Publication Date:
December 28, 2023
Filing Date:
May 05, 2023
Export Citation:
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Assignee:
TENCENT TECH SHENZHEN CO LTD (CN)
International Classes:
H10N60/12
Domestic Patent References:
WO2019032115A12019-02-14
Foreign References:
CN114256407A2022-03-29
CN111403590A2020-07-10
CN112885952A2021-06-01
CN113380942A2021-09-10
CN113903854A2022-01-07
US20200388745A12020-12-10
US20210399199A12021-12-23
Attorney, Agent or Firm:
BEIJING SAN GAO YONG XIN INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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