Title:
PROCESS FOR PRODUCTION OF EXPANDED URETHANE SHEET
Document Type and Number:
WIPO Patent Application WO/2012/086776
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a process for producing an expanded urethane sheet, whereby it becomes possible to produce a soft expanded urethane sheet having a low density and a high expansion ratio with good thickness accuracy even when the expanded urethane sheet has a low thickness.
One embodiment of the present invention is a process for producing an expanded urethane sheet, comprising: applying a composition containing a urethane prepolymer having an NCO group at the terminal of the molecule thereof onto a base to form a sheet-like coating film; bringing the coating film into contact with a perforated mold-release base; and exposing the coating film to water vapor while contacting the perforated mold-release base with the coating film to expand and cure the coating film.
Inventors:
KUSAKAWA KOICHI (JP)
Application Number:
PCT/JP2011/079864
Publication Date:
June 28, 2012
Filing Date:
December 22, 2011
Export Citation:
Assignee:
NHK SPRING CO LTD (JP)
KUSAKAWA KOICHI (JP)
KUSAKAWA KOICHI (JP)
International Classes:
B29C44/00; B29C33/04; B29C33/68; B29C39/26; B29C39/38; B29K75/00; B29L7/00; C09K3/10
Foreign References:
| JPH11246695A | 1999-09-14 | |||
| JPH09277278A | 1997-10-28 | |||
| JP2005023142A | 2005-01-27 |
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)
Masatoshi Kurata (JP)
Download PDF:
Claims:
Previous Patent: THERMOELECTRIC POWER GENERATION MODULE
Next Patent: DEVICE FOR PRODUCING SILICON AND METHOD FOR PRODUCING SILICON
Next Patent: DEVICE FOR PRODUCING SILICON AND METHOD FOR PRODUCING SILICON