PROCESS FOR THE PRODUCTION OF RESIST FLUOROPOLYMER

Title:

PROCESS FOR THE PRODUCTION OF RESIST FLUOROPOLYMER

Document Type and Number:

WIPO Patent Application WO/2004/063235

Kind Code:

A1

Abstract:

The invention provides a novel process for producing fluoropolymers, specifically, a process for producing photoresist fluoropolymers which are transparent to vacuum ultraviolet rays, particularly, F2 laser (157nm), and excellent in solubility in alkaline developers; and photoresist compositions containing the photoresist fluoropolymers. The process is a process for producing a resist fluoropolymer excellent in solubility in developers which comprises repeating units (M2)of alicyclic structure in the backbone chain and has in the polymer either acid-reactive groups (Y¹) or groups (Y²) convertible into acid-reactive groups (Y¹), characterized by radical-polymerizing a monomer mixture containing a monomer (m2) capable of imparting alicyclic structure to the backbone chain in the presence of both a radical polymerization initiator and a chain transfer agent represented by the general formula (1): R - (X)_n (1) wherein R is a C_1-20 hydrocarbon group optionally containing an ether linkage in which part of the hydrogen atoms may be replaced by fluorine; X is at least one functional group selected from the group consisting of oxygen-containing functional groups and substituted and unsubstituted amino groups; and n is an integer of 1 to 4.

Inventors:

ARAKI TAKAYUKI (JP)
ISHIKAWA TAKUJI (JP)
TORIUMI MINORU (JP)

Application Number:

PCT/JP2004/000031

Publication Date:

July 29, 2004

Filing Date:

January 07, 2004

Export Citation:

Click for automatic bibliography generation Help

Assignee:

DAIKIN IND LTD (JP)
ARAKI TAKAYUKI (JP)
ISHIKAWA TAKUJI (JP)
TORIUMI MINORU (JP)

International Classes:

C08F14/18; C08F214/18; (IPC1-7): C08F214/18

Foreign References:

JP2001350263A	2001-12-21
JP2001356480A	2001-12-26
JP2002543469A	2002-12-17
JP2001350265A	2001-12-21
JP2001296662A	2001-10-26

Attorney, Agent or Firm:

Asahina, Sohta (2-22 Tanimachi 2-chome, Chuo-ku, Osaka-sh, Osaka 12, JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: POLYMERISATION CATALYSTS WITH TRIAZENIDO LIGANDS

Next Patent: COMPOSITIONS AND TREATED SUBSTRATES HAVING REVERSIBLY ADAPTABLE SURFACE ENERGY PROPERTIES AND METHOD...