Title:
PROCESSING METHOD FOR PHOTORESIST LAYER, MANUFACTURING METHOD FOR DISPLAY PANEL, AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2023/082323
Kind Code:
A1
Abstract:
A processing method for a photoresist layer, a manufacturing method for a display panel, and a display panel. By performing exposure processing twice and performing development processing once on a negative photoresist layer (210), an undercut structure (214) can be prepared, and the preparation process of the undercut structure (214) is effectively simplified, thereby improving the production efficiency.
Inventors:
CHEN JIANRONG (CN)
Application Number:
PCT/CN2021/132308
Publication Date:
May 19, 2023
Filing Date:
November 23, 2021
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L27/32
Foreign References:
| CN110911461A | 2020-03-24 | |||
| CN107403823A | 2017-11-28 | |||
| CN107703722A | 2018-02-16 | |||
| CN109103349A | 2018-12-28 | |||
| CN111370451A | 2020-07-03 | |||
| CN103928497A | 2014-07-16 | |||
| JP2008305882A | 2008-12-18 |
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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