Title:
PRODUCTION METHOD FOR MICRO−STRIP FILTER
Document Type and Number:
WIPO Patent Application WO/2003/021712
Kind Code:
A1
Abstract:
A production method for a band−pass micro−strip filter which need not conduct an adjusting process on the central frequency in a pass band based on the frequency characteristics of a filter that have be previously measured and inspected after the filter is produced. The production method for a micro−strip filter includes the step of adjusting, in the production process, a resonator length according to the thickness and capacitance of a substrate that have been measured in advance.
Inventors:
HATTORI WATARU (JP)
Application Number:
PCT/JP2002/008575
Publication Date:
March 13, 2003
Filing Date:
August 26, 2002
Export Citation:
Assignee:
NEC CORP (JP)
HATTORI WATARU (JP)
HATTORI WATARU (JP)
International Classes:
H01L39/00; H01P1/203; H01P11/00; (IPC1-7): H01P11/00; H01P1/203
Foreign References:
| JPH04280502A | 1992-10-06 | |||
| JPH1041557A | 1998-02-13 |
Other References:
See also references of EP 1422783A4
Attorney, Agent or Firm:
Maruyama, Takao c/o Maruyama, Patent Office (SAM Build. 3floor 38-23, Higashi-Ikebukuro 2-chom, Toshima-ku Tokyo, JP)
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