Title:
PULSED ELECTRIC FIELD PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/242995
Kind Code:
A1
Abstract:
This pulsed electric field processing apparatus comprises: a pulsed power supply which generates pulsed voltage; a pair of electrodes which, upon application of the pulsed voltage thereto, generates a pulsed electric field; a processing chamber which is disposed between said electrodes and in which the pulsed electric field is generated in a space where a liquid processing object flows; a temperature calculation unit (42) which calculates a processing temperature which is the temperature of the processing object within the processing chamber, on the basis of a preset calibration value and a resistance value acquired from the pulsed voltage and pulsed current that flows through the processing object within the processing chamber when the pulsed voltage is applied; and a power supply control unit (41) which controls the pulsed power supply on the basis of the processing temperature and a preset target temperature.
Inventors:
INOUE TAKAHIRO (JP)
TSUDA SHINGO (JP)
SATO KIRIU (JP)
TSUDA SHINGO (JP)
SATO KIRIU (JP)
Application Number:
PCT/JP2022/023956
Publication Date:
December 21, 2023
Filing Date:
June 15, 2022
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
A23L3/32; A61L2/03
Foreign References:
| JP2000279144A | 2000-10-10 | |||
| JP2021114943A | 2021-08-10 |
Attorney, Agent or Firm:
TAKAMURA, Jun (JP)
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