Title:
PULSED ELECTRICAL FIELD PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/242996
Kind Code:
A1
Abstract:
A pulsed electrical field processing device according to the present invention comprises: a first processing unit (50) which performs, on a liquid treatment target object, a first treatment that is a pulsed electrical field treatment; a first pipe (60) through which the treatment target object having passed through the first processing unit (50) passes; a second processing unit (70) into which the treatment target object having passed through the first pipe (60) flows and which performs, on the treatment target object, a second treatment including a pulsed electrical field treatment; a second pipe (80) through which the treatment target object having passed through the second processing unit (70) passes; and a third processing unit (90) through which the treatment target object having passed through the second pipe (80) passes and which performs, on the treatment target object, a third treatment including a pulsed electrical field treatment. The second pipe (80) is higher in heat radiation performance than the first pipe (60).
Inventors:
INOUE TAKAHIRO (JP)
TSUDA SHINGO (JP)
SATO KIRIU (JP)
TSUDA SHINGO (JP)
SATO KIRIU (JP)
Application Number:
PCT/JP2022/023957
Publication Date:
December 21, 2023
Filing Date:
June 15, 2022
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
A23L3/32; A61L2/03
Foreign References:
| JPH11506011A | 1999-06-02 | |||
| JP2001017136A | 2001-01-23 |
Attorney, Agent or Firm:
TAKAMURA, Jun (JP)
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