Title:
QUANTUM DOT LOSSLESS PHOTOLITHOGRAPHIC PATTERNING METHOD AND DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/174195
Kind Code:
A1
Abstract:
Provided in the present invention are a quantum dot lossless photolithographic patterning method and device, the method comprising: making into a thin film a mixed solution of quantum dots and a photosensitive cross-linking agent containing diazirine groups; placing the thin film under ultraviolet light, and by means of a photomask, enabling an exposed region of the thin film receiving irradiation by the ultraviolet light to produce a cross-linking reaction; and by using a preset solvent, cleaning the thin film to elute an unexposed region of the thin film to perform developing, so as to obtain a patterned quantum dot thin film. The present invention performs crosslinking on surface ligands of the quantum dots by utilizing a photodecomposition reaction of the photosensitive cross-linking agent, avoids introduction of a complex photoresist, implements light-induced patterning of the quantum dots, can be compatible with mask aligner systems with different ultraviolet wavelengths widely applied at present, and is easy to popularize and implement.
Inventors:
ZHANG HAO (CN)
LI JINGHONG (CN)
LU SHAOYONG (CN)
LI JINGHONG (CN)
LU SHAOYONG (CN)
Application Number:
PCT/CN2023/081001
Publication Date:
September 21, 2023
Filing Date:
March 13, 2023
Export Citation:
Assignee:
UNIV TSINGHUA (CN)
International Classes:
H01L33/00
Foreign References:
| CN114839835A | 2022-08-02 | |||
| US20200259110A1 | 2020-08-13 | |||
| CN106715399A | 2017-05-24 | |||
| US6156478A | 2000-12-05 | |||
| CN111781803A | 2020-10-16 |
Attorney, Agent or Firm:
BEIJING SANYOU INTELLECTUAL PROPERTY AGENCY LTD. (CN)
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