Title:
RADIATION COOLING FILM MATERIAL
Document Type and Number:
WIPO Patent Application WO/2022/202992
Kind Code:
A1
Abstract:
Provided is a radiation cooling film material whereby a film material can be cooled under a daytime solar environment by a radiation cooling action, and whereby productivity can be enhanced when the radiation cooling film material is formed in canvas. The radiation cooling film material is configured in such a form that a radiation cooling layer CP is attached to the outer surface of a film material E, and the radiation cooling layer CP comprises an infrared radiation layer A that emits infrared light IR from a radiation surface H, and a light reflection layer B located on the reverse side of the infrared radiation layer A from the side on which the radiation surface H is present, the infrared radiation layer A is a resin material layer J comprising vinyl chloride resin or vinylidene chloride resin, the thickness of the infrared radiation layer A being adjusted so that thermal radiation energy greater than absorbed solar energy is emitted in the band of wavelength 8 μm to wavelength 14 μm, the light reflection layer B comprises silver or a silver alloy, and a film-material-side resin layer Ej formed from vinyl chloride resin or vinylidene chloride resin is provided on a back surface side of the film material E away from the radiation cooling layer CP.
Inventors:
SUEMITSU MASAHIRO (JP)
SUGIMOTO MASAYUKI (JP)
SUGIMOTO MASAYUKI (JP)
Application Number:
PCT/JP2022/013949
Publication Date:
September 29, 2022
Filing Date:
March 24, 2022
Export Citation:
Assignee:
OSAKA GAS CO LTD (JP)
International Classes:
B32B15/082; F24S70/225; F24S70/60
Domestic Patent References:
WO2020195743A1 | 2020-10-01 |
Foreign References:
JP2019103465A | 2019-06-27 | |||
JP2020182428A | 2020-11-12 | |||
CN111609596A | 2020-09-01 | |||
JP2018526599A | 2018-09-13 | |||
JP2019515967A | 2019-06-13 | |||
CN110216924A | 2019-09-10 | |||
JP3227268U | 2020-08-13 | |||
US20210002491A1 | 2021-01-07 | |||
JP2018526599A | 2018-09-13 |
Attorney, Agent or Firm:
R&C IP LAW FIRM (JP)
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