RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE

Title:

RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE

Document Type and Number:

WIPO Patent Application WO/2000/008525

Kind Code:

A1

Abstract:

A chemical amplification type radiation-sensitive composition comprising a film-forming resin based on a hydroxystyrene in combination with an onium salt precursor capable of generating a fluorinated alkanesulfonic acid as a radiation-sensitive acid-generating agent. This composition is free from the occurrence of corrosion of an apparatus owing to outgassing, the formation of a T-type pattern and the change of line width caused by a delay of processing time, and can be used for achieving a high sensitivity and resolving power and a good and stable pattern formation.

Inventors:

PAWLOWSKI GEORG (JP)
OKAZAKI HIROSHI (JP)
KINOSHITA YOSHIAKI (JP)
TSUGAMA NAOKO (JP)
HISHIDA ARITAKA (JP)
MA XIAO-MING (JP)
YAMAGUCHI YUKO (JP)

Application Number:

PCT/JP1999/004304

Publication Date:

February 17, 2000

Filing Date:

August 09, 1999

Export Citation:

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Assignee:

CLARIANT INT LTD (CH)
PAWLOWSKI GEORG (JP)
OKAZAKI HIROSHI (JP)
KINOSHITA YOSHIAKI (JP)
TSUGAMA NAOKO (JP)
HISHIDA ARITAKA (JP)
MA XIAO MING (JP)
YAMAGUCHI YUKO (JP)

International Classes:

C07C309/06; C07C381/12; G03F7/004; G03F7/038; G03F7/039; (IPC1-7): G03F7/004; G03F7/039; G03F7/038; C07C381/12; C07C309/06

Foreign References:

JPH1048814A	1998-02-20
JPH08248626A	1996-09-27
JPH0827094A	1996-01-30
JPH05222257A	1993-08-31
JPH1130865A	1999-02-02

Other References: