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Title:
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2022/138044
Kind Code:
A1
Abstract:
Provided is a radiation-sensitive composition which contains a polymer [P] having a radiation-sensitive onium cation structure and an organic anion structure and which satisfies at least one of (i) and (ii). (i) As the polymer [P], contained is a polymer having a radiation-sensitive onium cation structure having two or more substituent groups β of at least one type selected from the group consisting of a fluoroalkyl group and a fluoro group (excluding a fluoro group in a fluoroalkyl group). (ii) A compound [Q] having a radiation-sensitive onium cation structure and an organic anion structure (excluding the polymer [P]) is further contained, and as the compound [Q], contained is a compound having a radiation-sensitive onium cation structure having two or more substituent groups β.

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Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2021/044260
Publication Date:
June 30, 2022
Filing Date:
December 02, 2021
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
C08F20/24; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2016136563A12016-09-01
WO2020158337A12020-08-06
Foreign References:
JP2014178542A2014-09-25
JP2020046661A2020-03-26
JP2018159744A2018-10-11
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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