Title:
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2017/169440
Kind Code:
A1
Abstract:
The present invention is a radiation-sensitive composition that contains: a metal-containing component that includes particles that have a metal oxide as a main component; and an organic solvent. The metal-containing component includes two or more types of metal atoms. The metal atom content of the composition is at least 50 atomic% with respect to the total number of metal atoms and metalloid atoms. The metal-containing component preferably includes: first metal atoms that are at least one type of metal atom selected from titanium, zirconium, hafnium, zinc, tin, and indium; and second metal atoms that are at least one type of metal atom selected from lanthanum and yttrium.
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Inventors:
KASAHARA KAZUKI (JP)
VASILIKI KOSMA
MUFEI YU
EMMANUEL P GIANNELIS
CHRISTOPHER K OBER
VASILIKI KOSMA
MUFEI YU
EMMANUEL P GIANNELIS
CHRISTOPHER K OBER
Application Number:
PCT/JP2017/007484
Publication Date:
October 05, 2017
Filing Date:
February 27, 2017
Export Citation:
Assignee:
JSR CORP (JP)
UNIV CORNELL (US)
UNIV CORNELL (US)
International Classes:
G03F7/004; B41C1/055; B41N1/14
Foreign References:
| JP2015157807A | 2015-09-03 | |||
| JP2008242461A | 2008-10-09 | |||
| JP2001018354A | 2001-01-23 | |||
| JPH09169098A | 1997-06-30 | |||
| JP2007025678A | 2007-02-01 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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