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Patent Searching and Data


Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
Document Type and Number:
WIPO Patent Application WO/2021/241246
Kind Code:
A1
Abstract:
Provided are a radiation-sensitive resin composition capable of exhibiting adequate levels of sensitivity, LWR performance, and CDU performance, and a method for forming a pattern. This radiation-sensitive resin composition contains a solvent and an onium salt compound including a structure represented by formula (1). (In formula (1), Rf1 and Rf2 each independently represent a fluorine atom or a fluorinated monovalent hydrocarbon group having 1-20 carbon atoms. R1 represents a hydrogen atom, a monovalent hydrocarbon group having 1-20 carbon atoms, a fluorine atom, or a fluorinated monovalent hydrocarbon group having 1-20 carbon atoms. R2, R3, R4, R5, R6, and R7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1-20 carbon atoms. n1 is an integer of 0-4. When there are more than one of each of Rf1 and Rf2, such Rf1s and Rf2s are identical or different from each other. n2 is an integer of 0-4. When there are more than one of each of R1 and R2, such R1s and R2s are identical or different from each other. n1+n2 equals an integer of 2-8. n3 is an integer of 0-5. When there are more than one of each of R3 and R4, such R3s and R4s are identical or different from each other. X1 and X2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z+ represents a radiation-sensitive monovalent onium cation.)

Inventors:
NEMOTO RYUICHI (JP)
MIYAO KENSUKE (JP)
Application Number:
PCT/JP2021/018197
Publication Date:
December 02, 2021
Filing Date:
May 13, 2021
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
C07D317/72; C07D307/00; C07D311/00; C07D339/06; C07D407/12; C07D497/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Foreign References:
JP2014224991A2014-12-04
JP2019127482A2019-08-01
JP2014178645A2014-09-25
JP2012193160A2012-10-11
JP2020029451A2020-02-27
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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