Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTER USING SAME, AND SULFONIUM SALT COMPOUND AND RADIATION-SENSITIVE ACID GENERATOR COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2022/172685
Kind Code:
A1
Abstract:
Provided are a method for forming a resist pattern having excellent performance including sensitivity during a light exposure process, LWR performance and CDU performance even when a next-generation light exposure technology is applied thereto; a radiation-sensitive resin composition; and others. The radiation-sensitive resin composition comprises: a sulfonium salt compound represented by formula (1) (wherein R1 represents a monovalent hydrocarbon group having a cyclic structure, in which a methylene group constituting a hydrocarbon group may be substituted by an ether bond; Rf1 and Rf2 independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 1 to 4, in which, when m1 is 2 to 4, some or all of a plurality of Rf1's and Rf2's are the same as or different from each other; R2 and R3 independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; m2 represents an integer of 0 to 3, in which, when m2 is 2 to 3, some or all of a plurality of R2's and R3's are the same as or different from each other; X represents a single bond or a linker containing a bivalent hetero atom; R4 to R7 independently represent a hydrogen atom, a hydroxyl group, a monovalent hydrocarbon group, or an ester group; n1 and n2 independently represent an integer of 1 to 3, in which some or all of a plurality of R4's to R7's are the same as or different from each other; R8 represents a monovalent linear hydrocarbon group, a monovalent alicyclic hydrocarbon group, a monovalent fluorinated hydrocarbon group, a halogen atom, a monovalent aromatic hydrocarbon group, or a monovalent group represented by -Y-R8' (wherein Y represents -O-, -CO-, -COO-, or -OCO-; and R8' represents a monovalent hydrocarbon group having 1 to 20 carbon atoms); and l represents an integer of 0 to 5, in which, when l is 2 to 5, some or all of a plurality of R8's are the same as or different from each other); a resin containing a structural unit having an acid-dissociable group; and a solvent.
Inventors:
NEMOTO RYUICHI (JP)
FURUKAWA TSUYOSHI (JP)
INAMI HAJIME (JP)
OKAZAKI SATOSHI (JP)
FURUKAWA TSUYOSHI (JP)
INAMI HAJIME (JP)
OKAZAKI SATOSHI (JP)
Application Number:
PCT/JP2022/001062
Publication Date:
August 18, 2022
Filing Date:
January 14, 2022
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C07C309/19; C07C309/12; C07C381/12; C07D307/00; C07D317/70; C07D317/72; C07D321/06; C07D327/06; C07D333/46; C07D335/02; C07D493/10; C08F20/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| WO2015159830A1 | 2015-10-22 |
Foreign References:
| JP2014178645A | 2014-09-25 | |||
| JP2013033161A | 2013-02-14 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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