Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/228842
Kind Code:
A1
Abstract:
Provided are: a radiation-sensitive resin composition from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity can be formed even when forming a resist pattern with a high aspect ratio; and a pattern formation method. The radiation-sensitive resin composition contains: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit that has an acid-dissociable group; and a solvent. (In formula (1), R1 is a substituted or unsubstituted monovalent hydrocarbon group having 1-5 carbon atoms or a group including a divalent heteroatom-containing group between the carbon-carbon bonds of the aforementioned hydrocarbon group. R2 and R3 are each a hydrogen atom or a monovalent hydrocarbon group. One of Rf11 and Rf12 is a fluorine atom and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group. Z1
+ is a monovalent radiation-sensitive onium cation.) (In formula (2), R4 is a monovalent organic group that includes a cyclic structure and has 3-40 carbon atoms. Rf21 and Rf22 are each a fluorine atom or a monovalent fluorinated hydrocarbon group. Z2
+ is a monovalent radiation-sensitive onium cation.)
Inventors:
NEMOTO RYUICHI (JP)
MIYAKE MASAYUKI (JP)
INAMI HAJIME (JP)
FURUKAWA TSUYOSHI (JP)
OTSUKA NOBORU (JP)
MIYAO KENSUKE (JP)
MIYAKE MASAYUKI (JP)
INAMI HAJIME (JP)
FURUKAWA TSUYOSHI (JP)
OTSUKA NOBORU (JP)
MIYAO KENSUKE (JP)
Application Number:
PCT/JP2023/018516
Publication Date:
November 30, 2023
Filing Date:
May 18, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| WO2022113663A1 | 2022-06-02 |
Foreign References:
| JP2010020204A | 2010-01-28 | |||
| JP2010191015A | 2010-09-02 | |||
| JP2011002805A | 2011-01-06 | |||
| JP2010018573A | 2010-01-28 | |||
| JP2008007410A | 2008-01-17 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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